Compare Hitachi Virtual Storage Platform 5000 Series vs. Hitachi Virtual Storage Platform E990

Hitachi Virtual Storage Platform 5000 Series is ranked 10th in NVMe while Hitachi Virtual Storage Platform E990 is ranked 9th in NVMe. Hitachi Virtual Storage Platform 5000 Series is rated 0, while Hitachi Virtual Storage Platform E990 is rated 0. On the other hand, Hitachi Virtual Storage Platform 5000 Series is most compared with , whereas Hitachi Virtual Storage Platform E990 is most compared with .
Cancel
You must select at least 2 products to compare!
Ranking
10th
out of 11 in NVMe
Views
9
Comparisons
6
Reviews
0
Average Words per Review
0
Avg. Rating
N/A
9th
out of 11 in NVMe
Views
13
Comparisons
11
Reviews
0
Average Words per Review
0
Avg. Rating
N/A
Top Comparisons
Also Known As
Hitachi VSP 5000, Hitachi Virtual Storage Platform 5000Hitachi VSP E990
Learn
Hitachi
Hitachi
Overview

The patented Hitachi Accelerated Fabric allows Hitachi Storage Virtualization Operating System RF (SVOS RF) to offload I/O traffic as you scale out your data platform, delivering up to 21 million IOPS. Mixing NVMe and SAS flash together allows you to get the most economic $/GB rates available up to 69PB of capacity. And the platform is backed with a 100% data-availability guarantee.

100% DATA AVAILABILITY GUARANTEE. LOWEST COST PER IOPS IN THE INDUSTRY. ULTIMATE FLEXIBILITY IN CONSUMPTION.

Is your infrastructure futureproof? The Hitachi Virtual Storage Platform (VSP) portfolio delivers performance and agility today and scales to match future demands. Maintain digital business with a highly available 24/7 infrastructure. Stretch your budget and get more value from existing infrastructure.

Offer
Learn more about Hitachi Virtual Storage Platform 5000 Series
Learn more about Hitachi Virtual Storage Platform E990
We monitor all NVMe reviews to prevent fraudulent reviews and keep review quality high. We do not post reviews by company employees or direct competitors. We validate each review for authenticity via cross-reference with LinkedIn, and personal follow-up with the reviewer when necessary.